Coating process where a workpiece is sequentially coated by two different gasses in a heated vacuum container assisted by plasma. Beskrivning The process The workpiece is placed in a heated tank which is pumped out to a vacuum. Two different carrier gasses mixed with various substances are linked to the container. One gas mixture is admitted, reacts with, and coats the surface of the workpiece [A] supported by the plasma. The plasma accelerates the process and thus it’s a faster process. The remaining gas mixture is then pumped out again with a vacuum pump. Then the second base mixture is released into the chamber which then reacts with and builds on the previous coating [B]. Each alternating cycle that built the atomic layer on the surface and the number of cycles thus controls the thickness of the final coating. Plasma assisted chemical vapor deposition, PACVD
